Title

Characterizing acid mobility in chemically amplified resists via spectroscopic methods

Document Type

Conference Paper

Peer Reviewed

1

Publication Date

3-14-1999

Journal/Book/Conference Title

Advances in resist technology and processing XVI : Microlithpgraphy 1999 : 15-17 March, 1999, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering, v. 3678)

Conference Location

Santa Clara, California, United States

DOI of Published Version

10.1117/12.350279

Start Page

914

End Page

922

Published Article/Book Citation

Advances in Resist Technology and Processing XVI, 1999.

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URL

https://ir.uiowa.edu/cbe_pubs/18