Title
Characterizing acid mobility in chemically amplified resists via spectroscopic methods
Document Type
Conference Paper
Peer Reviewed
1
Publication Date
3-14-1999
Journal/Book/Conference Title
Advances in resist technology and processing XVI : Microlithpgraphy 1999 : 15-17 March, 1999, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering, v. 3678)
Conference Location
Santa Clara, California, United States
DOI of Published Version
10.1117/12.350279
Start Page
914
End Page
922
Published Article/Book Citation
Advances in Resist Technology and Processing XVI, 1999.
URL
https://ir.uiowa.edu/cbe_pubs/18