Title
Optimal sampling strategies for sub-100-nm overlay
Document Type
Conference Paper
Peer Reviewed
1
Publication Date
6-8-1998
Journal/Book/Conference Title
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering, v. 3332)
Conference Location
Santa Clara, CA, United States
DOI of Published Version
10.1117/12.308743
Start Page
348
End Page
359
Published Article/Book Citation
Metrology, Inspection, and Process Control for Microlithography XII, 1998.
URL
https://ir.uiowa.edu/cbe_pubs/54