Title

Optimal sampling strategies for sub-100-nm overlay

Document Type

Conference Paper

Peer Reviewed

1

Publication Date

6-8-1998

Journal/Book/Conference Title

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering, v. 3332)

Conference Location

Santa Clara, CA, United States

DOI of Published Version

10.1117/12.308743

Start Page

348

End Page

359

Published Article/Book Citation

Metrology, Inspection, and Process Control for Microlithography XII, 1998.

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URL

https://ir.uiowa.edu/cbe_pubs/54