Title

Spectroscopic characterization of acid mobility in chemically amplified resists

Document Type

Conference Paper

Peer Reviewed

1

Publication Date

2-27-2000

Journal/Book/Conference Title

Advances in Resist Technology and Processing XVII : 28 February - 1 March 2000, Santa Clara, USA (Proceedings of SPIE - The International Society for Optical Engineering, 3999-2)

Conference Location

Santa Clara, California, United States

DOI of Published Version

10.1117/12.388299

Start Page

161

End Page

170

Published Article/Book Citation

Advances in Resist Technology and Processing XVII, 2000.

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URL

https://ir.uiowa.edu/cbe_pubs/81