Title
Spectroscopic characterization of acid mobility in chemically amplified resists
Document Type
Conference Paper
Peer Reviewed
1
Publication Date
2-27-2000
Journal/Book/Conference Title
Advances in Resist Technology and Processing XVII : 28 February - 1 March 2000, Santa Clara, USA (Proceedings of SPIE - The International Society for Optical Engineering, 3999-2)
Conference Location
Santa Clara, California, United States
DOI of Published Version
10.1117/12.388299
Start Page
161
End Page
170
Published Article/Book Citation
Advances in Resist Technology and Processing XVII, 2000.
URL
https://ir.uiowa.edu/cbe_pubs/81