Spectroscopic characterization of acid mobility in chemically amplified resists
Advances in Resist Technology and Processing XVII : 28 February - 1 March 2000, Santa Clara, USA (Proceedings of SPIE - The International Society for Optical Engineering, 3999-2)
Santa Clara, California, United States
DOI of Published Version
Published Article/Book Citation
Advances in Resist Technology and Processing XVII, 2000.